SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles
Liebmann, Lars W., Mansfield, Scott M., Wong, Alfred K. K., Smolinski, Jacek G., Peng, Song, Kimmel, Kurt R., Rudzinski, Maciej W., Wiley, James N., Zurbrick, Larry S., Abboud, Frank E., Grenon, BrianVolume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373310
File:
PDF, 1.67 MB
english, 1999