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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Innovations in lithography metrology for characterization of phase-shift mask materials
Harrison, Dale A., Lam, John C., Forouhi, A. Rahim, Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410698
File:
PDF, 236 KB
english, 2001