SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication
Magg, Christopher, Lercel, Michael J., Lawliss, Mark, Kwong, Ranee W., Huang, Wu-Song, Angelopoulos, Marie, Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410750
File:
PDF, 487 KB
english, 2001