SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Evaluation of the standard addition method to determine rate constants for acid generation in chemically amplified photoresist at 157 nm
Pawloski, Adam R., Szmanda, Charles R., Nealey, Paul F., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436830
File:
PDF, 329 KB
english, 2001