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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography
Uetani, Yasunori, Hashimoto, Kazuhiko, Miya, Yoshiko, Yoshida, Isao, Takigawa, Mikio, Hanawa, Ryotaro, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436869
File:
PDF, 135 KB
english, 2001