SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Pattern shape analysis tool for quantitative estimate of photomask and process
Yonekura, Isao, Fukushima, Yuhichi, Matsuo, Fuyuhiko, Otaki, Masao, Fukugami, Norihito, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438360
File:
PDF, 2.47 MB
english, 2001