SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Unified mask data formats for EB writers
Kuriyama, Koki, Tanabe, Hiroyoshi, Suzuki, Toshio, Hirumi, Junji, Yoshioka, Nobuyuki, Hojo, Yutaka, Kawase, Yuichi, Hara, Shigehiro, Hoga, Morihisa, Watanabe, Satoshi W., Inoue, Masa, Kawase, HidemuchVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504218
File:
PDF, 139 KB
english, 2003