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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists
Junarsa, Ivan, Sturtevant, John L., Stoykovich, Mark P., Yoshimoto, Kenji, Nealey, Paul F.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.533776
File:
PDF, 366 KB
english, 2004