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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Advanced mask pattern correction method of alternating PSM: improvement of line width uniformity in the shifter length direction
Yoshida, Masamichi, Tanabe, Hiroyoshi, Ozawa, Ken, Ogawa, Kazuhisa, Ohnuma, HidetoshiVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557800
File:
PDF, 724 KB
english, 2004