SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Optimization of Alt-PSM structure for 45nm node ArF immersion lithography
Adachi, Takashi, Weed, J. Tracy, Martin, Patrick M., Mesuda, Kei, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, NaoyaVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.633307
File:
PDF, 317 KB
english, 2005