SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Newly developed RELACS materials and processes for the 65 nm node and beyond
Terai, Mamoru, Lin, Qinghuang, Kumada, Teruhiko, Ishibashi, Takeo, Hanawa, Tetsuro, Satake, Noboru, Takano, YusukeVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.651242
File:
PDF, 653 KB
english, 2006