SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Simulation of mask induced polarization effect on imaging in immersion lithography
Kwak, Eun-A, Flagello, Donis G., Jung, Mi-Rim, Kim, Dai-Gyoung, Lee, Ji-Eun, Oh, Hye-KeunVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656204
File:
PDF, 295 KB
english, 2006