SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Study of mask-induced polarization effects on att. PSM in immersion lithography
Mizoguchi, Takashi, Hoga, Morihisa, Kojima, Yousuke, Takagi, Mikio, Saga, Tadashi, Haraguchi, Takashi, Konishi, Toshio, Fukushima, Yuuichi, Tanaka, Tsuyoshi, Okuda, YoshimitsuVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681878
File:
PDF, 264 KB
english, 2006