SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - CD budget analysis on hole pattern in EUVL
Iriki, Nobuyuki, Lercel, Michael J., Aoyama, Hajime, Tanaka, ToshihikoVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711288
File:
PDF, 919 KB
english, 2007