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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Resist evaluation for contact hole patterning with thermal flow process
Tiron, R., Lin, Qinghuang, Petitdidier, C., Sourd, C., De Simone, D., Cotti, G., Annoni, E., Mortini, B.Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711678
File:
PDF, 437 KB
english, 2007