SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Parameter sensitive patterns for scatterometry monitoring
Xue, Jing, Naber, Robert J., Kawahira, Hiroichi, Ben, Yu, Wang, Chaohao, Miller, Marshal, Spanos, Costas J., Neureuther, Andrew R.Volume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746833
File:
PDF, 293 KB
english, 2007