SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography
Henderson, Clifford L., Wang, Mingxing, Lee, Cheng-Tsung, Henderson, Clifford L., Yueh, Wang, Roberts, Jeanette M., Gonsalves, Kenneth E.Volume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.769004
File:
PDF, 549 KB
english, 2008