SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond
Shigemura, Hiroyuki, Kawahira, Hiroichi, Zurbrick, Larry S., Amano, Tsuyoshi, Nishiyama, Yasushi, Suga, Osamu, Terasawa, Tsuneo, Arisawa, Yukiyasu, Hashimoto, Hideaki, Kameya, Norio, Takeda, Masaya, KVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801550
File:
PDF, 665 KB
english, 2008