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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Considering mask pellicle effect for more accurate OPC model at 45nm technology node
Wang, Ching-Heng, Chen, Alek C., Lin, Burn, Liu, Qingwei, Zhang, Liguo, Yen, AnthonyVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.805238
File:
PDF, 236 KB
english, 2008