SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Source optimization for three-dimensional image designs through film stacks
Melville, David O. S., Levinson, Harry J., Dusa, Mircea V., Rosenbluth, Alan E., Tian, Kehan, Goldfarb, Dario, Harrer, Stefan, Colburn, MatthewVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814700
File:
PDF, 501 KB
english, 2009