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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - The nebulous hotspot and algorithm variability
Singh, Vivek K., Wong, Alfred K. K., Lam, Edmund Y., Rieger, Michael L.Volume:
7275
Year:
2009
Language:
english
DOI:
10.1117/12.816449
File:
PDF, 410 KB
english, 2009