SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Study of electric-field-induced-development method
Terayama, Masatoshi, Hosono, Kunihiro, Sakurai, Hideaki, Sakai, Mari, Ito, Masamitsu, Ikenaga, Osamu, Funakoshi, Hideo, Shiozawa, Takahiro, Miyazaki, Syoutarou, Saito, Yoshihiko, Hayashi, NaoyaVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824310
File:
PDF, 172 KB
english, 2009