SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - A new x-ray metrology for profiling nanostructures of patterned media
Omote, Kazuhiko, Zurbrick, Larry S., Montgomery, M. Warren, Ito, Yoshiyasu, Okazaki, Yuko, Kokaku, YuichiVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833504
File:
PDF, 2.03 MB
english, 2009