SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Mask parameter variation in the context of the overall variation budget of an advanced logic wafer fab
Seltmann, Rolf, Behringer, Uwe F. W., Burbach, Gert, Parge, Anne, Busch, Jens, Hertzsch, Tino, Poock, Andre, Weisbuch, Francois, Holfeld, AndreVolume:
7470
Year:
2009
Language:
english
DOI:
10.1117/12.835166
File:
PDF, 1.44 MB
english, 2009