SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects
La Fontaine, Bruno M., Aoyama, Hajime, Tanaka, Yuusuke, Tawarayama, Kazuo, Nakamura, Naofumi, Soda, Eiichi, Oda, Noriaki, Arisawa, Yukiyasu, Uno, Taiga, Kamo, Takashi, Matsunaga, Kentaro, Kawamura, DaVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846325
File:
PDF, 4.46 MB
english, 2010