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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Data preparation solution for e-beam multiple pass exposure: reaching sub-22nm nodes with a tool dedicated to 45 nm
Martin, Luc, Herr, Daniel J. C., Manakli, Serdar, Bayle, Sébastien, Choi, Kang-Hoon, Gutsch, Manuela, Pradelles, Jonathan, Bustos, JessyVolume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.879059
File:
PDF, 3.67 MB
english, 2011