SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Effective decomposition algorithm for self-aligned double patterning lithography
Zhang, Hongbo, Du, Yuelin, Wong, Martin D. F., Topaloglu, Rasit, Conley, WillVolume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879324
File:
PDF, 376 KB
english, 2011