SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - CD error budget analysis for self-aligned multiple patterning
Oyama, Kenichi, Natori, Sakurako, Yamauchi, Shohei, Hara, Arisa, Yaegashi, Hidetami, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916280
File:
PDF, 6.98 MB
english, 2012