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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser lithography
Kagami, Ichiro, Ishikawa, Kiichi, Kakuta, Daichi, Kawahira, Hiroichi, Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373387
File:
PDF, 579 KB
english, 1999