SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists
Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Lin, Qinghuang, Dai, Junyan, Ober, Christopher K., FVolume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474242
File:
PDF, 505 KB
english, 2002