Lithography: Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch (Adv. Mater. 44/2012)
Kim, Seok, Jung, Howon, Kim, Yongwoo, Jang, Jinhee, Hahn, Jae W.Volume:
24
Journal:
Advanced Materials
DOI:
10.1002/adma.201290284
Date:
November, 2012
File:
PDF, 1.09 MB
2012