![](/img/cover-not-exists.png)
ChemInform Abstract: Process Dependence of the Si-SiO2 Interface Trap Density for Thin Oxides.
HUNG, K. K., CHENG, Y. C.Volume:
19
Journal:
ChemInform
DOI:
10.1002/chin.198809390
Date:
March, 1988
File:
PDF, 153 KB
1988