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ChemInform Abstract: In situ Doping of Silicon Films Prepared by Low Pressure Chemical Vapor Deposition Using Disilane and Phosphine.
MADSEN, L. D., WEAVER, L.Volume:
21
Journal:
ChemInform
DOI:
10.1002/chin.199037340
Date:
September, 1990
File:
PDF, 137 KB
1990