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Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro MatsuoVolume:
23
Year:
2009
Language:
english
Pages:
5
DOI:
10.1002/rcm.4250
File:
PDF, 245 KB
english, 2009