Contribution of ionic precursors to deposition rate of...

Journal of Physics Conference Series 2014 / 06 Vol. 518

Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD

Toko, S, Hashimoto, Y, Kanemitu, Y, Torigoe, Y, Seo, H, Uchida, G, Kamataki, K, Itagaki, N, Koga, K, Shiratani, M
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Volume:
518
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/518/1/012008
Date:
June, 2014
File:
PDF, 678 KB
english, 2014
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