3D Etching profile evolution simulations: Time dependence...

Journal of Physics Conference Series 2007 / 10 Vol. 86

3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO 2 etching in plasma

Radjenović, Branislav, Radmilović-Radjenović, Marija
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Volume:
86
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/86/1/012017
Date:
October, 2007
File:
PDF, 742 KB
english, 2007
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