![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Comparison of liquid- and vapor-phase silylation processes for 193-nm positive-tone lithography
Hartney, Mark A., Kunz, Roderick R., Eriksen, Lynn M., LaTulipe, Douglas C., Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154761
File:
PDF, 507 KB
english, 1993