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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Aqueous base developable novel deep-UV resist for KrF excimer laser lithography
Murata, Makoto, Takahashi, Toshihiko, Koshiba, Mitsunobu, Kawamura, Shin-ichi, Yamaoka, Tsuguo, Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20083
File:
PDF, 245 KB
english, 1990