SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - I-line photolithography: an investigation of resist bleachability and process performance
Degiorgis, Giorgio A. L. M., Pateri, Patrizia, Pilenga, Alberto, Hurditch, Rodney J., Beauchemin, Jr., Bernard T., Fitzgerald III, Edward A., Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20129
File:
PDF, 507 KB
english, 1990