SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Characterizing edge profiles of photomask structures with complementary information from SEM and AFM
Häßler-Grohne, Wolfgang, Hüser, Dorothee, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2014417
File:
PDF, 421 KB
english, 2013