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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Productivity improvement through automated operation of reticle defect inspection tools in a wafer fab environment
Holfeld, Christian, Wagner, Heiko, Tchikoulaeva, Anna, Loebeth, Steffen, Melzig, Stephan, Zhang, Yulin, Tanabe, Shinichi, Katoh, Takenori, Moriizumi, Koichi, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2014480
File:
PDF, 540 KB
english, 2013