SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Improving wafer level CD uniformity for logic applications utilizing mask level metrology and process
Cohen, Avi, Trautzsch, Thomas, Buttgereit, Ute, Graitzer, Erez, Hanuka, Ori, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2027348
File:
PDF, 1.59 MB
english, 2013