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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Effect of cleaning chemistry on MegaSonic damage
Singh, Sherjang, Dietze, Uwe, Dress, Peter, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2027974
File:
PDF, 515 KB
english, 2013