SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Patterning of EUVL binary etched multilayer mask
Takai, Kosuke, Motokawa, Takeharu, Murano, Koji, Kamo, Takashi, Hayashi, Naoya, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2033258
File:
PDF, 2.22 MB
english, 2013