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SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Use of ILT-based mask optimization for local printability enhancement
Kato, Kokoro, Tritchkov, Alexander, Kobelkov, Sergey, Rodin, Sergei, Sakajiri, Kyohei, Egorov, Evgueni, Woo, Soung-SuVolume:
9256
Year:
2014
Language:
english
DOI:
10.1117/12.2068493
File:
PDF, 2.89 MB
english, 2014