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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Development of an end-point detection procedure for the post-expose bake process
Miller, Michael L., Mellichamp, Duncan A., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209225
File:
PDF, 772 KB
english, 1995