SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Resist coating optimization on 8-in. deep-UV litho cell: modeling and application to 0.25-μm technology
Boutin, Daniel, Blash, Andrew A., Caire, Jean P., Poncet, Dominique, Fanton, Pierre, Danielou, Marianne, Previtali, Bernard, Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209234
File:
PDF, 353 KB
english, 1995