![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Plasma antireflective coating optimization using enhanced reflectivity modeling
Lucas, Kevin D., Vasquez, Jamie A., Jain, Ajay, Filipiak, Stanley M., Vuong, Tam, King, Charles F., Roman, Bernard J., Jones, Susan K.Volume:
3050
Year:
1997
Language:
english
DOI:
10.1117/12.275918
File:
PDF, 554 KB
english, 1997