SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design
Ackmann, Paul W., Brown, Stuart E., Edwards, Richard D., Downey, Doug, Michael, Mark, Turnquest, Karen L., Nistler, John L., Fuller, Gene E.Volume:
3051
Year:
1997
DOI:
10.1117/12.275998
File:
PDF, 590 KB
1997