![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Performance of excimer lasers as light sources for 193-nm lithography
Sedlacek, Jan H. C., Doran, Scott P., Fritze, Michael, Kunz, Roderick R., Rothschild, Mordechai, Uttaro, Ray S., Corliss, Daniel A., Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276008
File:
PDF, 788 KB
english, 1997