SPIE Proceedings [SPIE Microlithography '97 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Performance of excimer lasers as light sources for 193-nm lithography

Sedlacek, Jan H. C., Doran, Scott P., Fritze, Michael, Kunz, Roderick R., Rothschild, Mordechai, Uttaro, Ray S., Corliss, Daniel A., Fuller, Gene E.
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Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276008
File:
PDF, 788 KB
english, 1997
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